진공 챔버용 적외선 히터

Thu, 09 Jul 2026 04:43:09 +0800

서문
이런 상황을 생각해보세요: 고부하가 걸리는 진공 챔버를 운용 중에, 그 안에 있는 작은 가열 램프가 고장 나버립니다. 그러면 전체 작업이 멈춰버립니다. 더욱 심각한 것은, 값비싼 웨이퍼들이 오염될 수 있다는 점입니다.
바로 이런 문제를 해결하기 위해 우리는 진공 챔버용 적외선 가열기를 만들었습니다. 이것은 단순한 부품이 아닙니다. 시간과 비용, 그리고 정신적 스트레스를 초래할 수 있는 문제를 직접적으로 해결해주는 장치입니다. 핵심은, 램프가 고장 나는 문제나 그로 인한 혼란 없이도 강력하고 제어 가능한 열을 제공하는 것입니다.

진공 호환 적외선 히터

Sat, 06 Jun 2026 03:56:07 +0800

On the line, a wafer comes off the spin coater and the photoresist needs to be set—fast—without any hot/cold spots. A couple degrees off during soft bake or hard bake, and you’re staring down residual solvent, pattern collapse, and yield bleeding away. The heater has to deliver repeatable temperature, keep particles out, and stay stable in vacuum without disturbing the chamber.
What matters under the hood
We built a vacuum-compatible infrared heater around short-wave NIR sources, because direct energy transfer gives you fast response and tight thermal control. The emitter array is laid out to hit wafer-level uniformity within ±0.1°C, and closed-loop control holds setpoint steady across the bake curve.
It’s cleanroom-compatible for Class 1–100, using low-outgassing materials and a surface finish that keeps particle generation at zero. In vacuum, the output stays stable—no arcing—and the system is meant to run 24/7, on a scheduled maintenance rhythm instead of surprise downtime.
Why it holds up in production
For wafer drying, the infrared energy cuts through the water film and drives off moisture quickly, trimming cycle time and cutting down surface tension defects. For photoresist, the same platform handles soft bake and hard bake with disciplined thermal budget control, improving critical dimension uniformity and reducing footing.
The vacuum interface keeps chamber pressure consistent, so you can integrate into track tools or stand-alone ovens without process drift. The payoff is fewer scrap wafers, better line-to-line matching, and measurable energy savings from shorter bake times.
The practical details you can’t skip
The heater needs to be aligned to the wafer geometry and sized to the chamber footprint—mismatched optics or clearance will show up as edge-to-center deltas. Expect a warm-up window before thermal stability, and plan to calibrate at the tool level to match your resist profiles.
And don’t gloss over the vacuum feedthrough: proper sealing and bake-out procedures are mandatory to keep contamination from sneaking in during initial conditioning.

진공 on Ultra-Performance IR Heating

진공 챔버용 적외선 히터

진공 호환 적외선 히터